- Published: Tuesday, 22 December 2015 09:57
The Zeiss Xradia Versa 520 is a sub-micro resolution instrument with extensive imaging capabilities (Figure 1). The system bridges the gap in resolution between the traditional lower resolution (~100 to 5 μm) geometric magnification systems and the high resolution (~20 nm to 200 nm) X-ray optical systems. The system is fitted with X0.5, X4, X10, and X20 magnification lens mounted on a barrel mount for rapid change over; this lens configuration provides the capability of achieving resolutions down to 70 nm pixel size or spatial resolution or 0.7 µm. A versatile instrument, it can also be used for in-line phase contrast to increase contrast while imaging low absorbing specimens, a technique particularly useful for imaging biological specimens, tissue engineering and polymer materials.
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