Zeiss Xradia 520 Versa

Figure 1

Figure 1: Zeiss Xradia Versa 520 XCT system viewed from outside.

The Zeiss Xradia Versa 520 is a sub-micro resolution instrument with extensive imaging capabilities (Figure 1). The system bridges the gap in resolution between the traditional lower resolution (~100 to 5 μm) geometric magnification systems and the high resolution (~20 nm to 200 nm) X-ray optical systems. The system is fitted with X0.5, X4, X10, and X20 magnification lens mounted on a barrel mount for rapid change over; this lens configuration provides the capability of achieving resolutions down to 70 nm pixel size or spatial resolution or 0.7 µm. A versatile instrument, it can also be used for in-line phase contrast to increase contrast while imaging low absorbing specimens, a technique particularly useful for imaging biological specimens, tissue engineering and polymer materials.

Key features:

  • Resolution capability of 0.2 to 28 microns using lenses that combine both geometric and optical magnification
  • 40 to 160kV energy range with a power capability of 10W
  • Housed within an enlarged cabinet designed specifically for the application of in-situ rigs
  • In-line phase contrast capability for imaging low X-ray absorbing specimens
  • Scout and zoom software designed specifically for region of interest scanning
  • Exposure correction for high aspect ration specimens
  • Wide field mode for scanning wide specimens by stitching radiographs together to increase the field of view
  • Automated filter changer for rapid beam optimisation
  • Labyrinth for the external control and monitoring of user-installed equipment
  • Duel GPU reconstruction capability allows for minimal reconstruction time
  • For more information regarding the ZEISS Xradia Versa and the DCT capability, please contact Dr Sam McDonald.  

    For industrial collaborations please contact Dr James Carr 

    Login